Cleaning Solution For Semiconductor

Cleaning runs throughout the semiconductor manufacturing. The cleaning of semiconductors runs through the entire semiconductor process. From the silicon wafer manufacturing, it is necessary to clean the polished silicon wafer to remove surface contaminants, remove photoresist, wet etching, CVD, etc. in the chip preparation, and then to the final material quality inspection. Every step needs to be cleaned to ensure that the next step is free from impurities and maintain the yield of the product. At the same time, as the chip process continues to shrink, the number of cleanings required is increasing. According to statistics, the number of cleaning processes accounts for one-third of the entire chip manufacturing process, and is an important part of chip manufacturing. Very low surface tension and viscosity, it can be well dispersed and spread into various gaps, with good scouring and wetting cleaning effect.

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